During 7nm gate poly removal process, polysilicon is removed exposing both NFET and PFET fins in preparation for high-k gate oxide. If the polysilicon etch is too aggressive or the source and drain ...

For a long time, semiconductor defect inspection focused on particles, and particle defects remain an important cause of yield loss. But as devices have become more complex, additional kinds of ...

MILPITAS, Calif.--(BUSINESS WIRE)--Today KLA-Tencor Corporation (NASDAQ:KLAC), the world’s leading supplier of process control and yield management solutions for the semiconductor and related ...

MILPITAS, Calif., July 8, 2019 /PRNewswire/ -- Today KLA Corporation (NASDAQ: KLAC) announced the 392x and 295x optical defect inspection systems and the eDR7380™ e-beam defect review system. The new ...

The Atomic Force Microscope (AFM) has evolved from an extremely high resolution scientific research instrument into a highly accurate metrology tool. This evolution has broadened the role of the AFM ...

Tomocube, a 3D non-destructive inspection and metrology company, today announced the launch of HT-T1 Desktop (HT-T1D), a desktop holotomography system for high-resolution 3D defect analysis of glass ...

The wire blank shoots from the drawing die which molds it into the desired shape. Up to ten meters per second, the workpiece is fast – and thus can keep pace with world-class runners like Usain Bolt.

A unique optical configuration and multiple high-resolution cameras, in conjunction with long-lasting LED lighting, makes 360 degree inspection coverage possible on bottles that are translucent or ...

WASHINGTON—A material defect affecting PW1100G-JM-series high pressure turbine disks linked to a March 2020 uncontained engine failure may be more widespread than originally believed, prompting the ...